Publications

Export 3 results:
Sort by: [ Author  (Asc)] Title Type Year
A B C D E F G H I J K [L] M N O P Q R S T U V W X Y Z   [Show ALL]
L
Liu, A, Liu GX, Zhu HH, Xu F, Fortunato E, Martins R, Shan FK.  2014.  {Fully Solution-Processed Low-Voltage Aqueous In2O3 Thin-Film Transistors Using an Ultrathin ZrOx Dielectric}. ACS Applied Materials {&} Interfaces. 6:17364–17369., Number 20 AbstractWebsite

We reported here ?aqueous-route? fabrication of In2O3 thin-film transistors (TFTs) using an ultrathin solution-processed ZrOx dielectric thin film. The formation and properties of In2O3 thin films under various annealing temperatures were intensively examined by thermogravimetric analysis, Fourier transform infrared spectroscopy, and atomic force microscopy. The solution-processed ZrOx thin film followed by sequential UV/ozone treatment and low-temperature thermal-annealing processes showed an amorphous structure, a low leakage-current density (?1 ? 10?9 A/cm2 at 2 MV/cm), and a high breakdown electric field (?7.2 MV/cm). On the basis of its implementation as the gate insulator, the In2O3 TFTs based on ZrOx annealed at 250 °C exhibit an on/off current ratio larger than 107, a field-effect mobility of 23.6 cm2/V·s, a subthreshold swing of 90 mV/decade, a threshold voltage of 0.13 V, and high stability. These promising properties were obtained at a low operating voltage of 1.5 V. These results suggest that ?aqueous-route? In2O3 TFTs based on a solution-processed ZrOx dielectric could potentially be used for low-cost, low-temperature-processing, high-performance, and flexible devices.

Liu, GX, Liu A, Shan FK, Meng Y, Shin BC, Fortunato E, Martins R.  2014.  {High-performance fully amorphous bilayer metal-oxide thin film transistors using ultra-thin solution-processed ZrOx dielectric}. Applied Physics Letters. 105:113509., Number 11 AbstractWebsite

In this study, we report high-performance amorphous In2O3/InZnO bilayer metal-oxide (BMO) thin-film transistor (TFT) using an ultra-thin solution-processed amorphous ZrOx dielectric. A thin layer of In2O3 offers a higher carrier concentration, thereby maximizing the charge accumulation and yielding high carrier mobility. A thick amorphous layer of InZnO controls the charge conductance resulting in low off-state current and suitable threshold voltage. As a consequence, the BMO TFT showed higher filed-effect mobility (37.9 cm2/V s) than single-layer InZnO TFT (7.6 cm2/V s). Apart from that we obtain an on/off current ratio of 109, a subthreshold swing voltage of 120 mV/decade, and a voltage shift ≤ 0.4 V under positive bias stress for 2.5 h, for a gate voltage of 3 V and drain voltage of 1 V. These data demonstrate that the BMO TFT has great potential for a broad range of applications as switching low-power transistors.

Lyubchyk, A, Vicente A, Soule B, Alves PU, Mateus T, Mendes MJ, Águas H, Fortunato E, Martins R.  2016.  {Mapping the Electrical Properties of ZnO-Based Transparent Conductive Oxides Grown at Room Temperature and Improved by Controlled Postdeposition Annealing}, jan. Advanced Electronic Materials. 2:n/a–n/a., Number 1 AbstractWebsite
n/a