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Deuermeier, J, Bayer TJM, Yanagi H, Kiazadeh A, Martins R, Klein A, Fortunato E.  2016.  {Substrate reactivity as the origin of Fermi level pinning at the Cu2O/ALD-Al2O3 interface}. MATERIALS RESEARCH EXPRESS. 3, Number 4 Abstract
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Deuermeier, J, Wardenga HF, Morasch J, Siol S, Nandy S, Calmeiro T, Martins R, Klein A, Fortunato E.  2016.  {Highly conductive grain boundaries in copper oxide thin films}, jun. JOURNAL OF APPLIED PHYSICS. 119, Number 23 Abstract
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