Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH3)(3)
- Citation:
- Filonovich, Sergej Alexandrovich, Águas, Hugo, Busani, Tito, Vicente, António, Araújo, Andreia, Gaspar, Diana, Vilarigues, Marcia, Leitão, Joaquim, Fortunato, Martins R. 2012. Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH3)(3). Science and Technology of Advanced Materials. 13(4)
