@article {15457,
	title = {Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH3)(3)},
	journal = {Science and Technology of Advanced Materials},
	volume = {13},
	year = {2012},
	author = {Filonovich, Sergej Alexandrovich, and {\'A}guas, Hugo, and Busani, Tito, and Vicente, Ant{\'o}nio, and Ara{\'u}jo, Andreia, and Gaspar, Diana, and Vilarigues, Marcia, and Leit{\~a}o, Joaquim, and Fortunato and Martins, Rodrigo.}
}
