Transparent p-type SnOx thin film transistors produced by reactive rf magnetron sputtering followed by low temperature annealing | invisible

Transparent p-type SnOx thin film transistors produced by reactive rf magnetron sputtering followed by low temperature annealing

Citation:: Fortunato, E, Barros R, Barquinha P, Figueiredo V, Park SHK, Hwang CS, Martins R. 2010. Transparent p-type SnOx thin film transistors produced by reactive rf magnetron sputtering followed by low temperature annealing. Appl. Phys. Lett. . 97(052105 )