{Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature}
- Citation:
- Pereira, S, Gonçalves A, Correia N, Pinto J, Pereira LÍ, Martins R, Fortunato E. 2014. {Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature}. Solar Energy Materials and Solar Cells. 120, Part:109–115.
Abstract:
In this work we report the role of thickness on electrochromic behavior of nickel oxide (NiO) films deposited by e-beam evaporation at room temperature on ITO-coated glass. The structure and morphology of films with thicknesses between 100 and 500 nm were analyzed and then correlated with electrochemical response and transmittance modulation when immersed in 0.5 M LiClO4–PC electrolyte. The NiO exhibits an anodic coloration, reaching for the thickest film a transmittance modulation of 66{%} between colored and bleached state, at 630 nm, with a color efficiency of 55 cm2 C−1. Very fast switch between states was obtained, where coloration and bleaching times are 3.6 s cm−2 and 1.4 s cm−2, respectively.
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