We reported here ?aqueous-route? fabrication of In2O3 thin-film transistors (TFTs) using an ultrathin solution-processed ZrOx dielectric thin film. The formation and properties of In2O3 thin films under various annealing temperatures were intensively examined by thermogravimetric analysis, Fourier transform infrared spectroscopy, and atomic force microscopy. The solution-processed ZrOx thin film followed by sequential UV/ozone treatment and low-temperature thermal-annealing processes showed an amorphous structure, a low leakage-current density (?1 ? 10?9 A/cm2 at 2 MV/cm), and a high breakdown electric field (?7.2 MV/cm). On the basis of its implementation as the gate insulator, the In2O3 TFTs based on ZrOx annealed at 250 °C exhibit an on/off current ratio larger than 107, a field-effect mobility of 23.6 cm2/V·s, a subthreshold swing of 90 mV/decade, a threshold voltage of 0.13 V, and high stability. These promising properties were obtained at a low operating voltage of 1.5 V. These results suggest that ?aqueous-route? In2O3 TFTs based on a solution-processed ZrOx dielectric could potentially be used for low-cost, low-temperature-processing, high-performance, and flexible devices.

Aluminium-doped zinc oxide (AZO) is a common material used as a front contact layer on chalcopyrite CuInGaSe2 (CIGS)-based thin-film solar cells since it combines optimum optical and electrical properties with low cost and abundant elemental availability. Low-resistivity and high-transmission front contacts are required to develop high-performance CIGS solar cells. However, the durability of the cells is highly influenced by the corrosion resistance behaviour of the AZO layers. In this work, an exhaustive study of the aluminium-doped zinc oxide layers (AZO) deposited by pulsed DC magnetron sputtering (MS) has been performed. The optical, electrical and electrochemical corrosion resistance properties of the AZO layers have been evaluated as a function of the deposition pressure. The results show that adjusting the deposition pressure could develop AZO layers with very high electrochemical corrosion resistance in chlorinated aqueous media combined with optimum electrical and optical properties. Layers grown at 3×10−3mbar pressure present very high corrosion resistance values (in the order of 106 {\$}Ømega{\$}) and very high electrochemical stability, indicating no tendency for electrochemical corrosion degradation. Besides, these layers are highly transparent with an average transmittance in the visible range above 90{%} and with a low resistivity of 6.8×10−4 {\$}Ømega{\$}cm for a 1000nm films thickness, making them optimum candidate front contact for high-performance and high durability CIGS solar cells.

Here we present for the first time a TiO2/Cu2O all-oxide heterojunction solar cell entirely produced by spray pyrolysis onto fluorine doped tin oxide (FTO) covered glass substrates, using silver as a back contact. A combinatorial approach was chosen to investigate the impact of the TiO2 window layer and the Cu2O light absorber thicknesses. We observe an open circuit voltage up to 350mV and a short circuit current density which is strongly dependent of the Cu2O thickness, reaching a maximum of {\~{}}0.4mA/cm2. Optical investigation reveals that a thickness of 300nm spray pyrolysis deposited Cu2O is sufficient to absorb most photons with an energy above the symmetry allowed optical transition of 2.5eV, indicating that the low current densities are caused by strong recombination in the absorber that consists of small Cu2O grains.