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Deuermeier, J, Bayer TJM, Yanagi H, Kiazadeh A, Martins R, Klein A, Fortunato E.
2016.
{Substrate reactivity as the origin of Fermi level pinning at the Cu2O/ALD-Al2O3 interface}
.
MATERIALS RESEARCH EXPRESS. 3, Number 4
Abstract
n/a
Deuermeier, J, Wardenga HF, Morasch J, Siol S, Nandy S, Calmeiro T, Martins R, Klein A, Fortunato E.
2016.
{Highly conductive grain boundaries in copper oxide thin films}
, jun.
JOURNAL OF APPLIED PHYSICS. 119, Number 23
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n/a
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